Descriptions
System 4 brings together AMETEK Land’s world-leading range of highly accurate infrared and fibre optic thermometers with our Landmark signal processors, delivering plant operators a complete temperature measurement system capability.
A flexible solution tailored to your application, System 4 brings operators numerous safety, cost and product quality benefits. Operators can choose the components suited to their process, confident that they will work together reliably without the need for recalibration or constant maintenance. With thousands of installations in industrial environments System 4 has proven its durability and accuracy over many years of operation.
With its combination of focusable optics that don’t require the thermometer to be removed from its protective mounting jacket and through the lens sighting for clear, guaranteed target confirmation is assured. Optional close up lenses enable System 4 to provide accurate, drift-free measurements for targets as small as 0.45mm (0.02in).
Landmark signal processing delivers intelligent and stable process temperature measurements.
Highly accurate and offering fast response speeds, System 4 is designed for continuous quality and process monitoring, that can easily be used for process control in numerous glass, industrial processing and steel applications.
OUTSTANDING CHOICE
System 4’s advanced range of 38 models – single wavelength, ratio, fibre optic and fibre optic ratio versions – is fully interchangeable with four System 4 Landmark signal processors and a series of mounting options, which means there’s an ideal temperature measurement solution to fit your application.
EXCEPTIONAL MEASUREMENTS
System 4 pyrometers are rugged, precise and reliable, using through-the-lens sighting from as close as 90mm (3.5in), or flexible fibre optics for normally inaccessible areas – ensuring continuous product temperature measurements, whatever the process conditions.
DESIGNED FOR DIFFICULT ENVIRONMENTS
Suited to applications ranging from 0 °C (50 °F) to 2600 °C (4700 °F), the versatile System 4 range offers precise, dependable options designed to handle processes in harsh conditions, including high temperature and high RF environments.
Standard Thermometers | ||||
Model | Range | Wavelength | Response Time | Accuracy |
General Purpose, Metals, Glass, Refractories | ||||
M1 450/1000C | 450 to 1000 °C | 1µm | 5 ms | 0.4%K |
M1 850/1850F | 850 to 1850 °F | 1µm | 5 ms | 0.4%K |
M1 600/1600C | 600 to 1600 °C | 1µm | 5 ms | 0.4%K |
M1 1100/2900F | 1100 to 2900 °F | 1µm | 5 ms | 0.4%K |
M1 800/2600C | 800 to 2600 °C | 1µm | 5 ms | 0.7%K |
M1 1500/4700F | 1500 to 4700 °F | 1µm | 5 ms | 0.7%K |
General Purpose, Metals and Glass Processing | ||||
M2 300/1100C | 300 to 1100 °C | 1.6 µm | 5 ms | 0.25% + 1K |
M2 600/2000F | 600 to 2000 °F | 1.6 µm | 5 ms | 0.25% + 1K |
Bright Oxidised or Lightly Oxidised Metal Surfaces | ||||
M4 50/250C | 50 to 250 °C | 2.4 µm | 100 ms | 3K |
M4 150/500F | 150 to 500 °F | 2.4 µm | 100 ms | 3K |
M4 150/550C | 150 to 550 °C | 2.4 µm | 100 ms | 4K |
M4 300/1000F | 300 to 1000 °F | 2.4 µm | 100 ms | 4K |
General Purpose, Low Temperature, Metals, Glass, Food, Paper and Textiles | ||||
M6 0/300C | 0 to 300 °C | 3 to 5 µm | 100 ms | 0.3% + 2.5K |
M6 50/600F | 50 to 600 °F | 3 to 5 µm | 100 ms | 0.3% + 2.5K |
M6 100/700C | 100 to 700 °C | 3 to 5 µm | 100 ms | 0.3% + 2K |
M6 200/1300F | 200 to 1300 °F | 3 to 5 µm | 100 ms | 0.3% + 2K |
Plastic Thin Film | ||||
M7 25/375C | 25 to 375 °C | 3.43 µm | 100 ms | 3K |
M7 75/700F | 75 to 700 °F | 3.43 µm | 100 ms | 3K |
Ratio Thermometer, Variable Emissivity, Target Obscuration, Partially Filled Field of View | ||||
R1 600/1600C | 600 to 1600 °C | 0.85 to 1.1 µm | 100 ms | 0.65%K |
R1 1100/2900F | 1100 to 2900 °F | 0.85 to 1.1 µm | 100 ms | 0.65%K |
R1 1000/2600C | 1000 to 2600 °C | 0.85 to 1.1 µm | 100 ms | 1.1%K |
R1 1800/4700F | 1800 to 4700 °F | 0.85 to 1.1 µm | 100 ms | 1.1%K |
Fibroptic Thermometers | ||||
Model | Range | Wavelength | Response Time | Accuracy |
General Purpose, Metals, Glass, Refractories | ||||
M1 600/1600CYL | 600 to 1600 °C | 1 µm | 5 ms | 0.4%K |
M1 1100/2900FYL | 1100 to 2900 °F | 1 µm | 5 ms | 0.4%K |
M1 800/2600CYL | 800 to 2600 °C | 1 µm | 5 ms | 0.7%K |
M1 1500/4700FYL | 1500 to 4700 °F | 1 µm | 5 ms | 0.7%K |
General Purpose, Metals and Glass Processing | ||||
M2 300/1100CYL | 300 to 1100 °C | 1.6 µm | 5 ms | 0.25%K + 1K |
M2 600/2000FYL | 600 to 2000 °F | 1.6 µm | 5 ms | 0.25%K + 1K |
Low Temperature Applications | ||||
M3 50/250CQ | 50 to 250 °C | 2.1 µm | <100ms | 3K |
M3 150/500FQ | 150 to 500 °F | 2.1 µm | <100ms | 3K |
Ratio Thermometer, Variable Emissivity, Target Obscuration, Partially Filled Field of View | ||||
R1 600/1600CYL | 600 to 1600 °C | 0.85 to 1.1 µm | 100 ms | 0.65%K |
R1 1100/2900FYL | 1100 to 2900 °F | 0.85 to 1.1 µm | 100 ms | 0.65%K |
R1 1000/2600CYL | 1000 to 2600 °C | 0.85 to 1.1 µm | 100 ms | 1.1%K |
R1 1800/4700FYL | 1800 to 4700 °F | 0.85 to 1.1 µm | 100 ms | 1.1%K |