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An excellent final polishing suspension for most materials, this proprietary formula features a pH of 10 and rinses easily from samples and equipment, even after it dries. It is slow drying, making it an ideal choice for prolonged polishing requirements such as those for EBSD. The pH may be modified with chemical solutions to improve microstructural contrast.
| Item# | Item Name | Qty |
| 180-25015 | Colloidal Silica Suspension, 0.04 Micron, Non-Stick/Rinsable, 16 oz. (480 mL) | |
| 180-25010 | Colloidal Silica Suspension, 0.04 Micron, Non-Stick/Rinsable, 32 oz. (950 mL) | |
| 180-25000 | Colloidal Silica Suspension, 0.04 Micron, Non-Stick/Rinsable, 128 oz. (3.8 L) |
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